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金属薄膜 metal film
特性的研究characteristic study
微电源慎子micro-electronics
材料科学material scientific
重要课题important issue
主要论述了this paper mainly deals/discussed
溅射镀膜sputtering deposition/film by sputtering/sputter coating/sputtering coating
薄膜生长film growing/film growth
物理实验the physical experiment
动态监测dynamic system monitoring/dynamic supervising
还介绍了this paper also introduces
相关实验relative experimental
教学行手装置teaching device/teaching equipment
电路的circuital
实验条件lab condition/experiment condition
普通物理实验general physics experiment
教学中teaching
发挥重要作用playing an important role
使我们so that we
镀膜技术coating technology
广泛的研究wide research
关键词keywords

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Metal film preparation and its characteristics is one of the important topic of microelectronics and materials science. This paper mainly discusses the principle of sputtering, thin film growth principle, and in physics experiment in dynamic monitoring of film growth technology. It has also introduced the related experiment teaching device design, the circuit structures, experimental conditions such as the gain. The sputter coating and film growth dynamic monitoring applied to general physics experiment, especially in teaching can play an important role, it is better that we grasp this knowledge, and applied to practice. With the film coating technology unceasing development, the subject has broad prospects.Key words: metal film, sputtering, dynamic monitoring

Metal film preparation and its characteristics is one of the important topic of microelectronics and materials science. This paper mainly discusses the principle of sputtering, thin film growth principle, and in physics experiment in dynamic monitoring of film growth technology. It has also introduced the related experiment teaching device design, the circuit structures, experimental conditions such as the gain. The sputter coating and film growth dynamic monitoring applied to general physics experiment, especially in teaching can play an important role, it is better that we grasp this knowledge, and applied to practice. With the film coating technology unceasing development, the subject has broad prospects.

Making metal film and the study of its features is an important topic of modern microelectronics and materials science.Our dissertation mainly talks the principle of sputtering coating film,the principle of thin film growth and the technology of monitoring film in dynamic in physics experiment.It also introduces the related experiment teaching device design,the construct of circuis,the gaining of experimental condition and so on.To apply sputtering coatong film and monitoring film in dynamic to general physics experimnet,especially in teaching can play an important role ,It is better for us to grasp the knowledge and apply to practice.With the developement of the coatong film ,this topic has broad prospects
Key words:metal film sputtering coating film monitoring film in dynamic